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π bands and gap states from optical absorption and electron-spin-resonance studies on amorphous carbon and amorphous hydrogenated carbon films

机译:来自非晶碳和非晶氢化碳膜的光吸收和电子自旋共振研究的π能带和能隙状态

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摘要

Amorphous carbon a-C and amorphous hydrogenated carbon a-C:H films were prepared by rf sputtering of a graphite target in argon and argon-plus-hydrogen atmospheres, respectively. The optical-absorption coefficients of these films were measured by a spectrophotometer in the high-absorption range and by photothermal deflection spectroscopy in the low-absorption range. They were also studied by electron-spin-resonance (ESR) measurements. The optical-absorption spectrum is found to have a rather broad peak, in contrast to the sharp rise in absorption near the band gap observed for normal semiconductors. To explain this broad peak, a model density of states (DOS) for these materials is proposed, in accordance with their well-known microstructure. This consists of a pair of broad Gaussian-like distributions lying above and below the Fermi level and separated by about 4 eV, arising out of the π states of the aromatic sixfold rings that comprise the bulk of the graphitic sp2 regions, as well as pairs of discrete levels that are about 0.6 eV apart and are produced by fivefold and sevenfold rings present in these regions. The proposed DOS explains the essential features of the optical-absorption spectra and ESR data. The validity of the concept of the optical gap for these materials is also discussed.
机译:非晶碳a-C和非晶氢化碳a-C:H膜是通过分别在氩气和氩氢气氛中对石墨靶进行rf溅射制备的。这些膜的光吸收系数通过在高吸收范围内的分光光度计和在低吸收范围内的光热偏转光谱法来测量。还通过电子自旋共振(ESR)测量研究了它们。与在常规半导体中观察到的带隙附近的吸收急剧上升相反,发现光吸收光谱具有相当宽的峰。为了解释这个宽峰,根据它们众所周知的微观结构,提出了这些材料的模型状态密度(DOS)。它由一对在费米能级上下的宽高斯型分布以及大约4 eV隔开,这是由构成大部分石墨sp2区域的芳族六重环的π态引起的,以及成对的在这些区域中存在的五重环和七重环产生的离散电平的间隔约为0.6 eV。提出的DOS解释了光吸收光谱和ESR数据的基本特征。还讨论了这些材料的光学间隙概念的有效性。

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